1996IEEE Transactions on Electron DevicesRequires access

A self-convergence erase for NOR flash EEPROM using avalanche hot carrier injection

Shigeru Yamada, Takeshi Yamane, Kenta Amemiya, Kiyomi Naruke

Open publisher page 9 citations

Abstract

A new erasing method for simple stacked gate NOR Flash EEPROM's is proposed and is applied to 2 M bit NOR Flash test array using 0.6 /spl mu/m CMOS technology. Due to avalanche hot carrier injection after erasure by Fowler-Nordheim (F-N) tunneling current, the threshold voltages converge to a certain steady state. The steady state is a point of balance between the avalanche hot electron injection and the avalanche hot hole injection into the floating gate, and can be controlled easily by the channel doping and the applying control-gate voltage during convergence operation. The erasing method eliminates the problem of over-erased cells and realizes highly stable flash memory erasure.

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What this paper is about

A new erasing method for simple stacked gate NOR Flash EEPROM's is proposed and is applied to 2 M bit NOR Flash test array using 0.6 /spl mu/m CMOS technology. Due to avalanche hot carrier injection after erasure by Fowler-Nordheim (F-N) tunneling current, the threshold voltages converge to a certain steady state. The steady state is a point of balance between the avalanche hot electron injection and the avalanche hot hole injection into the floating gate, and can be controlled easily by the channel doping and the applying control-gate voltage during convergence operation. The erasing method eliminates the problem of over-erased cells and realizes highly stable flash memory erasure.

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Available abstract

A new erasing method for simple stacked gate NOR Flash EEPROM's is proposed and is applied to 2 M bit NOR Flash test array using 0.6 /spl mu/m CMOS technology. Due to avalanche hot carrier injection after erasure by Fowler-Nordheim (F-N) tunneling current, the threshold voltages converge to a certain steady state. The steady state is a point of balance between the avalanche hot electron injection and the avalanche hot hole injection into the floating gate, and can be controlled easily by the channel doping and the applying control-gate voltage during convergence operation. The erasing method eliminates the problem of over-erased cells and realizes highly stable flash memory erasure.

Key concepts: EEPROM, EPROM, Erasure, Hot-carrier injection, Flash (photography), Flash memory, Quantum tunnelling, Optoelectronics

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