2003Japanese Journal of Applied PhysicsRequires access

Thermal Desorption Process of Bromide on Si(111) Studied by Highly Sensitive Mass Spectroscopy

Tetsuro Shirao, Ken‐ichi Shudo, Yoshihito Tanaka, Toshinobu Nakajima, Tetsuya Ishikawa, Masatoshi Tanaka

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Abstract

Thermal Desorption Process of Bromide on Si(111) Studied by Highly Sensitive Mass Spectroscopy, Shirao, Tetsuro, Shudo, Ken-ichi, Tanaka, Yoshihito, Nakajima, Toshinobu, Ishikawa, Tetsuya, Tanaka, Masatoshi

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Thermal Desorption Process of Bromide on Si(111) Studied by Highly Sensitive Mass Spectroscopy, Shirao, Tetsuro, Shudo, Ken-ichi, Tanaka, Yoshihito, Nakajima, Toshinobu, Ishikawa, Tetsuya, Tanaka, Masatoshi

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Available abstract

Thermal Desorption Process of Bromide on Si(111) Studied by Highly Sensitive Mass Spectroscopy, Shirao, Tetsuro, Shudo, Ken-ichi, Tanaka, Yoshihito, Nakajima, Toshinobu, Ishikawa, Tetsuya, Tanaka, Masatoshi

Key concepts: Desorption, Thermal desorption spectroscopy, Thermal desorption, Analytical Chemistry (journal), Silicon, Isothermal process, Soft laser desorption, Mass spectrometry

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