Surface disorder induced Kikuchi features in reflection high-energy electron diffraction patterns of static and growing GaAs(001) films
P.K. Larsen, G. Meyer‐Ehmsen, B. Bölger, A. J. Hoeven
Abstract
P.K. Larsen, G. Meyer‐Ehmsen, B. Bölger, A. J. Hoeven
Abstract
Reflection high-energy electron diffraction (RHEED) investigations have been carried out on reconstructed GaAs(001)-2×4 surfaces under static conditions and during growth by molecular-beam epitaxy. Intensity modulation of streaks in the RHEED patterns is strongly enhanced during growth and high-intensity regions are found at angular positions corresponding to intersections of Kikuchi lines and streaks. The features are explained by a model assuming forward diffuse scattering in the surface layer due to long-range disorder followed by Kikuchi-type diffraction in the bulk.
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Reflection high-energy electron diffraction (RHEED) investigations have been carried out on reconstructed GaAs(001)-2×4 surfaces under static conditions and during growth by molecular-beam epitaxy. Intensity modulation of streaks in the RHEED patterns is strongly enhanced during growth and high-intensity regions are found at angular positions corresponding to intersections of Kikuchi lines and streaks. The features are explained by a model assuming forward diffuse scattering in the surface layer due to long-range disorder followed by Kikuchi-type diffraction in the bulk.
Key concepts: Reflection high-energy electron diffraction, Kikuchi line, Electron diffraction, Reflection (computer programming), Diffraction, Molecular beam epitaxy, Scattering, Materials science