2014Journal of NanomaterialsOpen access

Degradation of TCE by TEOS Coated nZVI in the Presence of Cu(II) for Groundwater Remediation

Amruthur S. Ramamurthy, Mahmoud M. Eglal

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Abstract

The removal of TCE by nanofer zero valent iron (nanofer ZVI) coated with tetraethyl orthosilicate (TEOS) in the presence of Cu(II) at different environmental conditions was studied. The kinetics of TCE degradation by nanofer ZVI was determined. At a dosage of 10 mg of nanofer ZVI, almost 63% of TCE was removed, when Cu(II) and TCE were present. It contrasts with 42% degradation of TCE in the absence of Cu(II). SEM/EDS images indicated that Cu(II) is reduced to form Cu0 and Cu2O. These formations are considered to be responsible for enhancing TCE degradation. Direct reduction involves hydrogenolysis and β‐elimination in the transformation of TCE, while indirect reduction involves atomic hydrogen and no direct electron transfer from the metal to reactants. The reduction of activation energy was also noted indicating that the rate limiting step for TCE degradation in the presence of Cu(II) is surface chemical reaction rather than diffusion. Most of iron present in nanofer ZVI get dissolved causing the generation of localized positive charge regions and form metal chlorides. Local accumulation of hydrochloric acid inside the pits regenerates new reactive surfaces to serve as sources of continuous electron generation. No significant effect of TCE was noticed for Cu(II) sequestration.

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The removal of TCE by nanofer zero valent iron (nanofer ZVI) coated with tetraethyl orthosilicate (TEOS) in the presence of Cu(II) at different environmental conditions was studied. The kinetics of TCE degradation by nanofer ZVI was determined. At a dosage of 10 mg of nanofer ZVI, almost 63% of TCE was removed, when Cu(II) and TCE were present. It contrasts with 42% degradation of TCE in the absence of Cu(II). SEM/EDS images indicated that Cu(II) is reduced to form Cu0 and Cu2O. These formations are considered to be responsible for enhancing TCE degradation. Direct reduction involves hydrogenolysis and β‐elimination in the transformation of TCE, while indirect reduction involves atomic hydrogen and no direct electron transfer from the metal to reactants. The reduction of activation energy was also noted indicating that the rate limiting step for TCE degradation in the presence of Cu(II) is surface chemical reaction rather than diffusion. Most of iron present in nanofer ZVI get dissolved causing the generation of localized positive charge regions and form metal chlorides. Local accumulation of hydrochloric acid inside the pits regenerates new reactive surfaces to serve as sources of continuous electron generation. No significant effect of TCE was noticed for Cu(II) sequestration.

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Available abstract

The removal of TCE by nanofer zero valent iron (nanofer ZVI) coated with tetraethyl orthosilicate (TEOS) in the presence of Cu(II) at different environmental conditions was studied. The kinetics of TCE degradation by nanofer ZVI was determined. At a dosage of 10 mg of nanofer ZVI, almost 63% of TCE was removed, when Cu(II) and TCE were present. It contrasts with 42% degradation of TCE in the absence of Cu(II). SEM/EDS images indicated that Cu(II) is reduced to form Cu0 and Cu2O. These formations are considered to be responsible for enhancing TCE degradation. Direct reduction involves hydrogenolysis and β‐elimination in the transformation of TCE, while indirect reduction involves atomic hydrogen and no direct electron transfer from the metal to reactants. The reduction of activation energy was also noted indicating that the rate limiting step for TCE degradation in the presence of Cu(II) is surface chemical reaction rather than diffusion. Most of iron present in nanofer ZVI get dissolved causing the generation of localized positive charge regions and form metal chlorides. Local accumulation of hydrochloric acid inside the pits regenerates new reactive surfaces to serve as sources of continuous electron generation. No significant effect of TCE was noticed for Cu(II) sequestration.

Key concepts: Environmental remediation, Degradation (telecommunications), Materials science, Groundwater, Groundwater remediation, Contaminated groundwater, Environmental chemistry, Chemical engineering

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