Self-assembly technology for reconfigured wafer-to-wafer 3D integration
Takafumi Fukushima, Eiji Iwata, K.-W. Lee, Tetsu Tanaka, Mitsumasa Koyanagi
Abstract
Takafumi Fukushima, Eiji Iwata, K.-W. Lee, Tetsu Tanaka, Mitsumasa Koyanagi
Abstract
We have introduced a new 3D stacking technology called reconfigured wafer-to-wafer 3D integration using surface tension-powered multichip self-assembly and multichip transfer techniques. Many Si chips were simultaneously self-assembled to a carrier wafer named “reconfigured wafer”. High-precision chip alignment with sub-micron-scale accuracy can be realized by optimizing self-assembly conditions. In addition, we developed a new self-assembled multichip bonder to three-dimensionally stack many known good dies (KDGs) on 8-inch wafers at the wafer level. By using the equipment, the many self-assembled Si chips were transferred to another target wafer in batch.
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We have introduced a new 3D stacking technology called reconfigured wafer-to-wafer 3D integration using surface tension-powered multichip self-assembly and multichip transfer techniques. Many Si chips were simultaneously self-assembled to a carrier wafer named “reconfigured wafer”. High-precision chip alignment with sub-micron-scale accuracy can be realized by optimizing self-assembly conditions. In addition, we developed a new self-assembled multichip bonder to three-dimensionally stack many known good dies (KDGs) on 8-inch wafers at the wafer level. By using the equipment, the many self-assembled Si chips were transferred to another target wafer in batch.
Key concepts: Wafer, Wafer-scale integration, Die preparation, Wafer backgrinding, Stacking, Materials science, Wafer testing, Wafer-level packaging