2006•MRS ProceedingsRequires access

A Novel MO Precursor for Metal Tantalum and Tantalum Nitride Film

Ken'ichi Sekimoto, Taishi Furukawa, Noriaki Oshima, Ken-ichi Tada, Tetsu Yamakawa

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Key concepts: Tantalum, Tantalum nitride, Materials science, Chemical vapor deposition, Tantalum carbide, Atomic layer deposition, Thermal decomposition, Nitride

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