Quantum distributed model of the resonant tunneling transistor
Hideaki Taniyama, M. Tomizawa, Ayumi Yoshii
Abstract
Hideaki Taniyama, M. Tomizawa, Ayumi Yoshii
Abstract
Two-dimensional simulation is crucial in the analysis of the transport characteristics of a resonant tunneling transistor that has a base electrode attached to the well region of a double barrier structure because of the transistor's two-dimensional heterogeneousness. We propose a novel numerical model of the resonant tunneling transistor that includes two-dimensional potential distribution and two-dimensional spatial current distribution. By using this mode in the present model, it is found that the transistor's I-V characteristics are strongly dependent on its internal well resistance.>
OpenAlex reports 8 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
Two-dimensional simulation is crucial in the analysis of the transport characteristics of a resonant tunneling transistor that has a base electrode attached to the well region of a double barrier structure because of the transistor's two-dimensional heterogeneousness. We propose a novel numerical model of the resonant tunneling transistor that includes two-dimensional potential distribution and two-dimensional spatial current distribution. By using this mode in the present model, it is found that the transistor's I-V characteristics are strongly dependent on its internal well resistance.>
Key concepts: Quantum tunnelling, Transistor, Optoelectronics, Physics, Electrical engineering, Engineering, Voltage