2000•Physics Letters ARequires access

Modeling of the relationship between implantation parameters and implantation dose during plasma immersion ion implantation

Xiubo Tian, Paul K. Chu

Open publisher page 20 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

OpenAlex reports 20 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Plasma-immersion ion implantation, Ion implantation, Wafer, Microelectronics, Plasma, Materials science, Ion beam, Ion

Back to paper search Browse research topics Original source

Modeling of the relationship between implantation parameters and implantation dose during plasma immersion ion implantation — Research Paper | ScholarLens