1987•Unpublished venueRequires access
Three Dimensional Process Simulator for Photo and Electron Beam Lithography, and Estimations of Proximity Effects
Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, Kazuhiko Ikeda, S. Hayama, S. Tomida
Open publisher page 2 citations
Abstract
In both photo lithography with reduction projection printings and electron beam lithography with direct writing techniques, their resolutions are limited by the proximity effect caused by the diffraction in photo lithography and electron backscattering in electron beam lithography, respectively. To evaluate and clear them, computer simulation is very useful for sub-micron pattern fabrications.