2006IEEE Transactions on MagneticsOpen access

Improvement of zone control induction heating equipment for high-speed processing of semiconductor devices

Daisuke Miyagi, A. V. S. S. R. Sai, N. Takahashi, Naoki Uchida, Kazuhiro Ozaki

Open full text 42 citations

Abstract

In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

Open-access reader

About this research paper

What this paper is about

In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

Why it matters

OpenAlex reports 42 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

In order to process a semiconductor device of high quality, uniform heating is necessary, but it is not easy to heat uniformly with conventional induction heating equipment. To solve this problem, zone control induction heating equipment has been jointly developed. In this paper, we examine the effect of dividing an induction heater into several small coil groups having different current and frequency, using the finite-element method. We describe the heating characteristics of the zone control coil groups and show that nearly uniform heating is possible by controlling both current and frequency.

Key concepts: Induction heating, Induction coil, Electromagnetic coil, Heating element, Semiconductor, Process (computing), Materials science, Semiconductor device

Related papers

Back to paper searchBrowse research topicsOriginal source
Improvement of zone control induction heating equipment for high-speed processing of semiconductor devices — Research Paper | ScholarLens