1997•MRS ProceedingsRequires access

High Rate Deposition of a-SiNxH by VHF PECVD

Toshiyuki Takagi, Yukito Nakagawa, Y. Watabe, Kazushige Takechi, Shinichi Nishida

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Key concepts: Materials science, Plasma-enhanced chemical vapor deposition, Deposition (geology), Plasma, Amorphous silicon, Silicon nitride, Amorphous solid, Chemical vapor deposition

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