Model of DOS near the Top of Valence Band in Strained Si1-xGex/(001)Si
Jian Song, Heng Sheng Shan, He Ming Zhang, Hui Yong Hu, Guan Yu Wang, Jian Li, Xiao Bo Xu
Abstract
Jian Song, Heng Sheng Shan, He Ming Zhang, Hui Yong Hu, Guan Yu Wang, Jian Li, Xiao Bo Xu
Abstract
Strained Si1-xGex technology has been widely adopted to enhance hole mobility. One of the most important physical parameters is density of state near the top of valence band in strained Si1-xGex materials. In this paper, we first obtained the hole effective mass along arbitrarily k wavevector directions, the hole isotropic effective masses and density of state effective mass of hole in strained Si1-xGex/(001)Si with the framework of K.P theory. And then, model of density of state near the top of valence band in strained Si1-xGex/(001)Si materials was established, which can provide valuable references to the understanding on its material physics and theoretical basis on the other important physical parameters.
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Strained Si1-xGex technology has been widely adopted to enhance hole mobility. One of the most important physical parameters is density of state near the top of valence band in strained Si1-xGex materials. In this paper, we first obtained the hole effective mass along arbitrarily k wavevector directions, the hole isotropic effective masses and density of state effective mass of hole in strained Si1-xGex/(001)Si with the framework of K.P theory. And then, model of density of state near the top of valence band in strained Si1-xGex/(001)Si materials was established, which can provide valuable references to the understanding on its material physics and theoretical basis on the other important physical parameters.
Key concepts: Valence band, Effective mass (spring–mass system), Valence (chemistry), Materials science, Isotropy, Germanium, Electron mobility, Condensed matter physics