2008IEEE Electron Device LettersRequires access

Externally Assembled Gate-All-Around Carbon Nanotube Field-Effect Transistor

Zhihong Chen, Damon B. Farmer, Sheng Xu, Roy G. Gordon, Phaedon Avouris, Joerg Appenzeller

Open publisher page 135 citations

Abstract

In this letter, we demonstrate a gate-all-around single-wall carbon nanotube field-effect transistor. This is the first successful experimental implementation of an off-chip gate and gate-dielectric assembly with subsequent deposition on a suitable substrate. The fabrication process and device measurements are discussed in the letter. We also argue in how far charges in the gate oxide are responsible for the observed nonideal device performance.

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What this paper is about

In this letter, we demonstrate a gate-all-around single-wall carbon nanotube field-effect transistor. This is the first successful experimental implementation of an off-chip gate and gate-dielectric assembly with subsequent deposition on a suitable substrate. The fabrication process and device measurements are discussed in the letter. We also argue in how far charges in the gate oxide are responsible for the observed nonideal device performance.

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OpenAlex reports 135 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

In this letter, we demonstrate a gate-all-around single-wall carbon nanotube field-effect transistor. This is the first successful experimental implementation of an off-chip gate and gate-dielectric assembly with subsequent deposition on a suitable substrate. The fabrication process and device measurements are discussed in the letter. We also argue in how far charges in the gate oxide are responsible for the observed nonideal device performance.

Key concepts: Materials science, Gate dielectric, Gate oxide, Carbon nanotube, Carbon nanotube field-effect transistor, Fabrication, Field-effect transistor, Transistor

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