Angle‐resolved XPS analysis of molybdenum and tungsten in passive films on stainless steel PVD alloys
C.-O.A. Olsson, H. J. Mathieu, D. Landolt
Abstract
C.-O.A. Olsson, H. J. Mathieu, D. Landolt
Abstract
Abstract Passive films on physical vapour deposited alloys, based on 304L with additions of 20 at.% of molybdenum and tungsten, were studied with angle‐resolved XPS. The samples were anodically polarized in a sulphate solution to potentials in the low and high passive region, respectively. In the low passive region, the Mo spectrum contained a strong contribution of Mo(IV) hydroxide. In the high passive region, higher fractions of hexavalent species were found; W(VI) gave a stronger contribution than Mo(VI), as can be understood by the lower solubility of the W(VI) salts. Contributions to tetravalent molybdenum were found to consist of oxide (MoO 2 ) as well as oxyhydroxide compounds. For tungsten, the dominating tetravalent contribution was WO 2 . Copyright © 2002 John Wiley & Sons, Ltd.
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Abstract Passive films on physical vapour deposited alloys, based on 304L with additions of 20 at.% of molybdenum and tungsten, were studied with angle‐resolved XPS. The samples were anodically polarized in a sulphate solution to potentials in the low and high passive region, respectively. In the low passive region, the Mo spectrum contained a strong contribution of Mo(IV) hydroxide. In the high passive region, higher fractions of hexavalent species were found; W(VI) gave a stronger contribution than Mo(VI), as can be understood by the lower solubility of the W(VI) salts. Contributions to tetravalent molybdenum were found to consist of oxide (MoO 2 ) as well as oxyhydroxide compounds. For tungsten, the dominating tetravalent contribution was WO 2 . Copyright © 2002 John Wiley & Sons, Ltd.
Key concepts: Molybdenum, X-ray photoelectron spectroscopy, Tungsten, Tungsten Compounds, Hydroxide, Materials science, Solubility, Oxide