2008•Unpublished venueRequires access

Modeling of temperature dependent IC-VBE characteristics of SiGe HBTs from 43–400K

Ziyan Xu, Xiaoyun Wei, Guofu Niu, Lan Luo, Dylan Thomas, John D. Cressler

Open publisher page 13 citations

Abstract

This paper examines modeling of IC-VBEfrom 43 to 400 K in a 50 GHz peak ƒTSiGe HBT technology. Existing temperature scaling equations are shown to fail below 200 K. New temperature scaling equations are proposed, and demonstrated to work well over a wide temperature range of 43–400 K. Implications to VBE— T and ΔVBE— T for two transistors biased at different current densities are discussed.

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What this paper is about

This paper examines modeling of IC-VBEfrom 43 to 400 K in a 50 GHz peak ƒTSiGe HBT technology. Existing temperature scaling equations are shown to fail below 200 K. New temperature scaling equations are proposed, and demonstrated to work well over a wide temperature range of 43–400 K. Implications to VBE— T and ΔVBE— T for two transistors biased at different current densities are discussed.

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OpenAlex reports 13 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

This paper examines modeling of IC-VBEfrom 43 to 400 K in a 50 GHz peak ƒTSiGe HBT technology. Existing temperature scaling equations are shown to fail below 200 K. New temperature scaling equations are proposed, and demonstrated to work well over a wide temperature range of 43–400 K. Implications to VBE— T and ΔVBE— T for two transistors biased at different current densities are discussed.

Key concepts: Scaling, Physics, Materials science, Mathematics, Geometry

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