Modeling of temperature dependent IC-VBE characteristics of SiGe HBTs from 43–400K
Ziyan Xu, Xiaoyun Wei, Guofu Niu, Lan Luo, Dylan Thomas, John D. Cressler
Abstract
Ziyan Xu, Xiaoyun Wei, Guofu Niu, Lan Luo, Dylan Thomas, John D. Cressler
Abstract
This paper examines modeling of IC-VBEfrom 43 to 400 K in a 50 GHz peak ƒTSiGe HBT technology. Existing temperature scaling equations are shown to fail below 200 K. New temperature scaling equations are proposed, and demonstrated to work well over a wide temperature range of 43–400 K. Implications to VBE— T and ΔVBE— T for two transistors biased at different current densities are discussed.
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This paper examines modeling of IC-VBEfrom 43 to 400 K in a 50 GHz peak ƒTSiGe HBT technology. Existing temperature scaling equations are shown to fail below 200 K. New temperature scaling equations are proposed, and demonstrated to work well over a wide temperature range of 43–400 K. Implications to VBE— T and ΔVBE— T for two transistors biased at different current densities are discussed.
Key concepts: Scaling, Physics, Materials science, Mathematics, Geometry