The Discharge Properties of Nickel Sulfide Thin Film Prepared from Sulfidation of Nickel Foil
Jong Seon Kim, Gun Whan Lee, Ki Won Kim, Jou Hyen Ahn, Gyu-Bong Cho, Ho Suk Ryu, Hyo Jun Ahn
Abstract
Jong Seon Kim, Gun Whan Lee, Ki Won Kim, Jou Hyen Ahn, Gyu-Bong Cho, Ho Suk Ryu, Hyo Jun Ahn
Abstract
The nickel sulfide (Ni3S2) thin film could be prepared from Ni/S double layer, which was deposited on nickel foil using evaporation and sputtering. The nickel sulfide electrode was discharged and charged between 0.6V and 2.6V versus Li/Li+ at room temperature. The nickel sulfide film had the first discharge capacity of 270mAh/g, and two plateaus at 1.3V and 1.8V.
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The nickel sulfide (Ni3S2) thin film could be prepared from Ni/S double layer, which was deposited on nickel foil using evaporation and sputtering. The nickel sulfide electrode was discharged and charged between 0.6V and 2.6V versus Li/Li+ at room temperature. The nickel sulfide film had the first discharge capacity of 270mAh/g, and two plateaus at 1.3V and 1.8V.
Key concepts: Sulfidation, Nickel, Nickel sulfide, Materials science, FOIL method, Sulfide, Thin film, Electrode