2.5 kHz high repetition rate XeCl excimer laser
Shigeyuki Takagi, Noboru Okamoto, Kouji Kakizaki, Saburo Sato, Tatsumi Goto
Abstract
Shigeyuki Takagi, Noboru Okamoto, Kouji Kakizaki, Saburo Sato, Tatsumi Goto
Abstract
An XeCl excimer laser was operated at the high repetition rate of 2.5 kHz, which can circulate the laser gas uniformly and efficiently. The characteristics of the gas flow rate and the average laser power versus the repetition rate were investigated in both He and Ne buffer gas mixtures. In He buffer gas, the average laser power saturates at 1.3 kHz and, thereafter, drops abruptly. On the other hand, stable operation at the highest repetition rate, 2.5 kHz, has been attained in Ne buffer at a gas flow rate of 54 m/s with an average laser power of 87 W.
OpenAlex reports 13 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
An XeCl excimer laser was operated at the high repetition rate of 2.5 kHz, which can circulate the laser gas uniformly and efficiently. The characteristics of the gas flow rate and the average laser power versus the repetition rate were investigated in both He and Ne buffer gas mixtures. In He buffer gas, the average laser power saturates at 1.3 kHz and, thereafter, drops abruptly. On the other hand, stable operation at the highest repetition rate, 2.5 kHz, has been attained in Ne buffer at a gas flow rate of 54 m/s with an average laser power of 87 W.
Key concepts: Buffer gas, Excimer laser, Laser, Volumetric flow rate, Gas laser, Excimer, Materials science, Repetition (rhetorical device)