1999•Mathematical and Computer ModellingOpen access

Optimal design of a high pressure organometallic chemical vapor deposition reactor

Klaus J. Bachmann, Harvey Thomas Banks, C. Höpfner, G. M. Kepler, Stacie LeSure, Sonya D. McCall, J.S. Scroggs

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Key concepts: Reactor design, Multidisciplinary approach, Chemical vapor deposition, Deposition (geology), Computer science, Organometallic chemistry, Process engineering, Chemical engineering

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