2008•Microelectronics ReliabilityRequires access

Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies

F. Chen, O. Bravo, D. Harmon, M. Shinosky, J. Aitken

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Key concepts: Time-dependent gate oxide breakdown, Dielectric strength, Low-k dielectric, Reliability (semiconductor), Materials science, Dielectric, Scaling, Node (physics)