Pressure dependence of the OH-stretching mode in F-rich natural topaz and topaz-OH
Kazuki Komatsu, Hiroyuki Kagi, T. Okada, Takahiro Kuribayashi, John B. Parise, Y. Kudoh
Abstract
Kazuki Komatsu, Hiroyuki Kagi, T. Okada, Takahiro Kuribayashi, John B. Parise, Y. Kudoh
Abstract
OH stretching vibration modes for F-rich natural topaz (F-topaz) and for fully hydrated topaz (topaz-OH) synthesized at high pressure, were observed using IR and Raman spectroscopies at pressures up to 30.4 GPa and 17.3 GPa, respectively. In F-topaz, the pressure derivative of the frequency of the OH stretching band observed at 3650 cm -1 at ambient pressure was 0.91(3) cm -1 /GPa, which was consistent with the value recently reported by Bradbury and Williams (2003). On the other hand, in topaz-OH, the pressure derivatives of the bands initially at 3599 and 3522 cm -1 were -5.2(2) and -2.56(6) cm -1 /GPa, respectively. This contrasting behavior between the two forms of topaz at high pressures suggests that the OH substitution for F in topaz affects the hydrogen-bonding behavior under high pressure.
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OH stretching vibration modes for F-rich natural topaz (F-topaz) and for fully hydrated topaz (topaz-OH) synthesized at high pressure, were observed using IR and Raman spectroscopies at pressures up to 30.4 GPa and 17.3 GPa, respectively. In F-topaz, the pressure derivative of the frequency of the OH stretching band observed at 3650 cm -1 at ambient pressure was 0.91(3) cm -1 /GPa, which was consistent with the value recently reported by Bradbury and Williams (2003). On the other hand, in topaz-OH, the pressure derivatives of the bands initially at 3599 and 3522 cm -1 were -5.2(2) and -2.56(6) cm -1 /GPa, respectively. This contrasting behavior between the two forms of topaz at high pressures suggests that the OH substitution for F in topaz affects the hydrogen-bonding behavior under high pressure.
Key concepts: Topaz, High pressure, Raman spectroscopy, Chemistry, Materials science, Mineralogy, Crystallography, Analytical Chemistry (journal)