1989Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access

Recombination And Dissociative Recombination Of H 2 + And H 3 + Ions On Surfaces With Application To Hydrogen Negative Ion Sources

John R. Hiskes, A. M. Karo

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Abstract

A four-step model for recombination and dissociative recombination of H2+ and H3+ ions on metal surfaces is discussed. Vibrationally excited molecules, H2(v''), from H3+ recombination are produced in a broad spectrum that enhances the excited level distribution. The application of this latter process to hydrogen negative ion discharges is discussed.

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A four-step model for recombination and dissociative recombination of H2+ and H3+ ions on metal surfaces is discussed. Vibrationally excited molecules, H2(v''), from H3+ recombination are produced in a broad spectrum that enhances the excited level distribution. The application of this latter process to hydrogen negative ion discharges is discussed.

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Available abstract

A four-step model for recombination and dissociative recombination of H2+ and H3+ ions on metal surfaces is discussed. Vibrationally excited molecules, H2(v''), from H3+ recombination are produced in a broad spectrum that enhances the excited level distribution. The application of this latter process to hydrogen negative ion discharges is discussed.

Key concepts: Dissociative recombination, Recombination, Excited state, Ion, Atomic physics, Hydrogen, Dissociation (chemistry), Molecule

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