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Etch pits and dislocation in {1012} Czochralski sapphire wafers

K.M. Kim, S. H. McFarlane

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Abstract

The reliability of fused KOH for revealing dislocations in the (1̄012) rhombohedral plane in Czochralski-grown sapphire single crystals was investigated by using x-ray-transmission topography. It was found that the etch pits represent closely the dislocations in the (1̄012) sapphire, although a one-to-one correspondence was not established.

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What this paper is about

The reliability of fused KOH for revealing dislocations in the (1̄012) rhombohedral plane in Czochralski-grown sapphire single crystals was investigated by using x-ray-transmission topography. It was found that the etch pits represent closely the dislocations in the (1̄012) sapphire, although a one-to-one correspondence was not established.

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Available abstract

The reliability of fused KOH for revealing dislocations in the (1̄012) rhombohedral plane in Czochralski-grown sapphire single crystals was investigated by using x-ray-transmission topography. It was found that the etch pits represent closely the dislocations in the (1̄012) sapphire, although a one-to-one correspondence was not established.

Key concepts: Sapphire, Czochralski method, Dislocation, Materials science, Wafer, Crystallography, Etch pit density, Trigonal crystal system

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