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An rf bridge technique for contactless measurement of the carrier lifetime in silicon wafers

T. Tiedje, Joel I. Haberman, R. W. Francis, Amal K. Ghosh

Open publisher page 38 citations

Abstract

A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.

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What this paper is about

A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.

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OpenAlex reports 38 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.

Key concepts: Photoconductivity, Wafer, Carrier lifetime, Optoelectronics, Materials science, Silicon, Diode, Flash (photography)

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