An rf bridge technique for contactless measurement of the carrier lifetime in silicon wafers
T. Tiedje, Joel I. Haberman, R. W. Francis, Amal K. Ghosh
Abstract
T. Tiedje, Joel I. Haberman, R. W. Francis, Amal K. Ghosh
Abstract
A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.
OpenAlex reports 38 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.
Key concepts: Photoconductivity, Wafer, Carrier lifetime, Optoelectronics, Materials science, Silicon, Diode, Flash (photography)