1998Applied OpticsRequires access

Design of a high-resolution extreme-ultraviolet imaging spectrometer with aberration-corrected concave gratings

Tatsuo Harada, Hideo Sakuma, Kaoru Takahashi, Tetsuya Watanabe, Hirohisa Hara, Toshiaki Kita

Open publisher page 24 citations

Abstract

A high-resolution extreme-ultraviolet imaging spectrometer is designed for the Japanese solar mission Solar-B. A spherical varied-line-space (SVLS) grating and a toroidal uniform-line-space (TULS) grating are chosen as candidates for use in the spectrometer to yield high spectral and spatial resolution within the spectral range 25-29 nm. The spectral image-focusing properties and the mechanical tolerances for fabrication and alignment are compared for the two types of grating. The SVLS design is found to be superior to the TULS design for off-plane spectral images and in ease of fabrication and optical alignment.

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What this paper is about

A high-resolution extreme-ultraviolet imaging spectrometer is designed for the Japanese solar mission Solar-B. A spherical varied-line-space (SVLS) grating and a toroidal uniform-line-space (TULS) grating are chosen as candidates for use in the spectrometer to yield high spectral and spatial resolution within the spectral range 25-29 nm. The spectral image-focusing properties and the mechanical tolerances for fabrication and alignment are compared for the two types of grating. The SVLS design is found to be superior to the TULS design for off-plane spectral images and in ease of fabrication and optical alignment.

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Available abstract

A high-resolution extreme-ultraviolet imaging spectrometer is designed for the Japanese solar mission Solar-B. A spherical varied-line-space (SVLS) grating and a toroidal uniform-line-space (TULS) grating are chosen as candidates for use in the spectrometer to yield high spectral and spatial resolution within the spectral range 25-29 nm. The spectral image-focusing properties and the mechanical tolerances for fabrication and alignment are compared for the two types of grating. The SVLS design is found to be superior to the TULS design for off-plane spectral images and in ease of fabrication and optical alignment.

Key concepts: Optics, Spectrometer, Extreme ultraviolet, Imaging spectrometer, Ultraviolet, Diffraction grating, Stray light, Materials science

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