Sheldon S. Q. Wu, Thomas F. Soules, Ralph H. Page, Scott C. Mitchell, V. Keith Kanz, Raymond John Beach
Abstract
Demonstration of 795-nm Rubidium laser using a buffer gas consisting of pure 3He is reported. The use of 3He yields enhanced mixing of the Rb fine-structure levels and enables efficient lasing at reduced buffer gas pressures.
OpenAlex reports 1 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
Demonstration of 795-nm Rubidium laser using a buffer gas consisting of pure 3He is reported. The use of 3He yields enhanced mixing of the Rb fine-structure levels and enables efficient lasing at reduced buffer gas pressures.
Key concepts: Buffer gas, Rubidium, Lasing threshold, Laser, Buffer (optical fiber), Materials science, Resonance (particle physics), Optoelectronics