2005•Optics LettersRequires access

Manufacture of a 10-km-scale radius-of-curvature surface by use of a thin-film coating technique

S. Miyoki, M. Ohashi, K. Waseda, Hiroshi Karoji, T. Tomaru

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Abstract

We tried a method of making a 10-km-class large-radius-of-curvature surface that would satisfy both low microroughness (0.1 nm rms) and low waviness (lambda/100) by forming a spherically curved film with a low-loss coating technique on a flat surface produced by mechanical (chemical) polishing. We obtained a SiO2 surface with a 10255 +/- 250-m radius of spherical curvature that had less than lambda/30 waviness and 0.4-nm micro-roughness over a 9-cm-diameter area.

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We tried a method of making a 10-km-class large-radius-of-curvature surface that would satisfy both low microroughness (0.1 nm rms) and low waviness (lambda/100) by forming a spherically curved film with a low-loss coating technique on a flat surface produced by mechanical (chemical) polishing. We obtained a SiO2 surface with a 10255 +/- 250-m radius of spherical curvature that had less than lambda/30 waviness and 0.4-nm micro-roughness over a 9-cm-diameter area.

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Available abstract

We tried a method of making a 10-km-class large-radius-of-curvature surface that would satisfy both low microroughness (0.1 nm rms) and low waviness (lambda/100) by forming a spherically curved film with a low-loss coating technique on a flat surface produced by mechanical (chemical) polishing. We obtained a SiO2 surface with a 10255 +/- 250-m radius of spherical curvature that had less than lambda/30 waviness and 0.4-nm micro-roughness over a 9-cm-diameter area.

Key concepts: Waviness, Materials science, Radius of curvature, Curvature, Polishing, Optics, RADIUS, Coating

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