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2004•Journal of Crystal GrowthRequires access

Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all alkoxide precursor

Paul R. Chalker, Richard J. Potter, John L. Roberts, Anthony C. Jones, Lesley M. Smith, Marcus Schumacher

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Key concepts: Tantalate, Bismuth, Alkoxide, Strontium, Thin film, Materials science, Chemical vapor deposition, Oxide

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