2009•Japanese Journal of Applied PhysicsOpen access

High-Transmittance Free-Standing Aluminum Extreme Ultraviolet Filter

Masatoshi Hatayama, Hisataka Takenaka, Eric M. Gullikson, Akira Suda, Katsumi Midorikawa

Abstract

We have designed and fabricated a high-transmittance, extremely flat, free-standing extreme ultraviolet (EUV) filter for the wavelength region between 17–50 nm. The Al thin-film filter, which is coated with a SiC film to increase its oxidation tolerance, has a transmittance of 29% at 30 nm. This value is approximately 5 times higher than that of an uncoated filter fabricated using a conventional method.

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Key concepts: Transmittance, Extreme ultraviolet lithography, Extreme ultraviolet, Materials science, Ultraviolet, Filter (signal processing), Aluminium, Optics