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Surface Evaluation Of The Grazing Incidence Mirrors For The Extreme Ultraviolet Explorer

James Green, David S. Finley, Stuart Bowyer, Roger F. Malina

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Abstract

The Space Astrophysics Group at the University of California, Berkeley, is currently producing four grazing incidence mirrors for the Extreme Ultraviolet Explorer. In conjunction with this effort, we are developing improved methods for the evaluation of these mirrors' performance. Imaging and reflectivity analyses at optical and extreme ultraviolet (EUV) wavelengths allow us to quantify a mirror's performance with regard to effective area, surface roughness, and image blur. We present here the results from our most recent EUV measurements, and our latest techniques for evaluating the surface microroughness.

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What this paper is about

The Space Astrophysics Group at the University of California, Berkeley, is currently producing four grazing incidence mirrors for the Extreme Ultraviolet Explorer. In conjunction with this effort, we are developing improved methods for the evaluation of these mirrors' performance. Imaging and reflectivity analyses at optical and extreme ultraviolet (EUV) wavelengths allow us to quantify a mirror's performance with regard to effective area, surface roughness, and image blur. We present here the results from our most recent EUV measurements, and our latest techniques for evaluating the surface microroughness.

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Available abstract

The Space Astrophysics Group at the University of California, Berkeley, is currently producing four grazing incidence mirrors for the Extreme Ultraviolet Explorer. In conjunction with this effort, we are developing improved methods for the evaluation of these mirrors' performance. Imaging and reflectivity analyses at optical and extreme ultraviolet (EUV) wavelengths allow us to quantify a mirror's performance with regard to effective area, surface roughness, and image blur. We present here the results from our most recent EUV measurements, and our latest techniques for evaluating the surface microroughness.

Key concepts: Extreme ultraviolet lithography, Extreme ultraviolet, Optics, Ultraviolet, Surface roughness, Ultraviolet astronomy, Wavelength, Remote sensing

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