Specific features of recombination in layered a-Si:H films
I. A. Kurova, N. N. Ormont
Abstract
I. A. Kurova, N. N. Ormont
Abstract
The absorbed light spectral composition determines the type of carrier generation: interband generation or mixed generation that also includes the generation of electrons from levels of the valence-band tail. The generation type affects the value and temperature dependence of the electron recombination rate in a -Si:H layered films. This effect is caused by a variation in the occupation of the levels of silicon dangling bonds and the valence band tail with electrons upon a change in the carrier generation type. As a result, in the case of mixed carrier generation in the investigated films with a low concentration of native dangling bonds, electron recombination in the films is slow and recombination at the levels of the valence-band tail can prevail up to room temperature.
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The absorbed light spectral composition determines the type of carrier generation: interband generation or mixed generation that also includes the generation of electrons from levels of the valence-band tail. The generation type affects the value and temperature dependence of the electron recombination rate in a -Si:H layered films. This effect is caused by a variation in the occupation of the levels of silicon dangling bonds and the valence band tail with electrons upon a change in the carrier generation type. As a result, in the case of mixed carrier generation in the investigated films with a low concentration of native dangling bonds, electron recombination in the films is slow and recombination at the levels of the valence-band tail can prevail up to room temperature.
Key concepts: Recombination, Dangling bond, Electron, Silicon, Valence band, Valence (chemistry), Materials science, Carrier lifetime