1996Surface and Coatings TechnologyRequires access

Comparison of the structure of PVD-thin films deposited with different deposition energies

E. Lugscheider, C. Barimani, Christian Wolff, S. Guerreiro, G. Doepper

Open publisher page 55 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

OpenAlex reports 55 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Materials science, Thin film, Deposition (geology), Physical vapor deposition, Evaporation, Electron beam physical vapor deposition, Ion plating, Sputter deposition

Related papers

Back to paper searchBrowse research topicsOriginal source
Comparison of the structure of PVD-thin films deposited with different deposition energies — Research Paper | ScholarLens