1990•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access
Target x-ray source lithography and photolithography mixed and match system
Shūzo Hattori, Shinzo Morita, Akihiro Yoshida, Tsutomu Nomura, Takashi Tagawa, Hideshi Yoshikawa
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Abstract
Target X-ray source lithography and photo lithography mixed and match system was proposed for an effective lithography system. The key technology for the system is a projection moire alignment, whose marks are used for both photo and X-ray lithography. In order to realize the systeimi, related technologies and apparatus are developing, which are photo and X-ray stepper, Xray source of radiation cooled slotted Pd target, X-ray mask and X-ray mask inspection system.