Effect of erbium ion concentration on gain spectral hole burning in silica-based erbium-doped fiber
S. Ono, Setsuhisa Tanabe, Masato Nishihara, Etsuko Ishikawa
Abstract
S. Ono, Setsuhisa Tanabe, Masato Nishihara, Etsuko Ishikawa
Abstract
The erbium concentration dependence of gain spectral hole burning in EDF was investigated. We propose the energy transfer mechanism between Er ions, which contributes to the suppression of the second-hole at 1530 nm.
OpenAlex reports 1 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
The erbium concentration dependence of gain spectral hole burning in EDF was investigated. We propose the energy transfer mechanism between Er ions, which contributes to the suppression of the second-hole at 1530 nm.
Key concepts: Erbium, Spectral hole burning, Erbium doped fiber amplifier, Materials science, Ion, Doping, Energy transfer, Optoelectronics