Factors affecting residues of pesticides in tea

Abstract This paper presents a discussion on residue behaviour of 17 pesticides on tea, on the basis of the research conducted during the last 20 years. Sunlight photolysis and growth dilution were the most important factors affecting pesticide persistence in the growing tea plant, while vapour pressure played an important role in loss of pesticide residues during tea processing. The percentage of pesticide extracted during the tea infusion process was highly related to water solubility. It is suggested that in studies on pesticide residue behaviour on tea, all the four factors should be considered integrally.