Beam current density distribution of a vacuum arc ion source
А. Г. Николаев, Е. М. Oks, Xiaoji Zhang, Cheng Cheng
Abstract
А. Г. Николаев, Е. М. Oks, Xiaoji Zhang, Cheng Cheng
Abstract
The distribution of the beam current density for metal ion vacuum arc ion sources (MEVVA-type) lacks sufficient uniformity and its original form is similar to the Gaussian one. This is because of the plasma generation in a small space near the cathode spot. Further expansion of the plasma to the emission region does not improve this situation which poses a serious problem in creating a broad beam ion source. This article presents experimental results on the influence of various factors on the beam current density distribution. Experiments were carried out in Beijing with the MEVVA-IIA ion source. An additional magnetic field was applied to the arc gap and a small metal grid covering the emission electrode was used.
OpenAlex reports 5 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
The distribution of the beam current density for metal ion vacuum arc ion sources (MEVVA-type) lacks sufficient uniformity and its original form is similar to the Gaussian one. This is because of the plasma generation in a small space near the cathode spot. Further expansion of the plasma to the emission region does not improve this situation which poses a serious problem in creating a broad beam ion source. This article presents experimental results on the influence of various factors on the beam current density distribution. Experiments were carried out in Beijing with the MEVVA-IIA ion source. An additional magnetic field was applied to the arc gap and a small metal grid covering the emission electrode was used.
Key concepts: Vacuum arc, Ion gun, Ion beam deposition, Ion source, Atomic physics, Materials science, Cathode, Plasma