1987•Journal of The Electrochemical SocietyOpen access

X‐Ray Photoelectron Spectroscopy Studies on the Oxidation Behavior of CoNi Thin Films

D. Majumdar, R. Spähn, J.-S. Gau

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Abstract

The oxidation behavior of films of varying composition was studied using x‐ray photoelectron spectroscopy (XPS). At 500°C and under of oxygen, preferential oxidation of cobalt over nickel was observed in the alloys, although pure cobalt and pure nickel showed similar oxidation kinetics. The cobalt oxide, identified as , grew parabolically at a rate dependent on the alloy composition. Oxidation‐induced segregation of cobalt at the surface was also observed in the alloys.

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The oxidation behavior of films of varying composition was studied using x‐ray photoelectron spectroscopy (XPS). At 500°C and under of oxygen, preferential oxidation of cobalt over nickel was observed in the alloys, although pure cobalt and pure nickel showed similar oxidation kinetics. The cobalt oxide, identified as , grew parabolically at a rate dependent on the alloy composition. Oxidation‐induced segregation of cobalt at the surface was also observed in the alloys.

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Available abstract

The oxidation behavior of films of varying composition was studied using x‐ray photoelectron spectroscopy (XPS). At 500°C and under of oxygen, preferential oxidation of cobalt over nickel was observed in the alloys, although pure cobalt and pure nickel showed similar oxidation kinetics. The cobalt oxide, identified as , grew parabolically at a rate dependent on the alloy composition. Oxidation‐induced segregation of cobalt at the surface was also observed in the alloys.

Key concepts: X-ray photoelectron spectroscopy, Cobalt, Nickel, Alloy, Materials science, Oxide, Cobalt oxide, Oxygen

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