Optical instrumentation for microelectronics
Evgeni Gurevich, Ya. I. Tochitskiĭ, V. I. Tsuran
Abstract
Evgeni Gurevich, Ya. I. Tochitskiĭ, V. I. Tsuran
Abstract
This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.
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This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.
Key concepts: Microelectronics, Integrated circuit, Wafer, Instrumentation (computer programming), Electronic circuit, Transistor, Electronics, Optoelectronics