2007Review of Scientific InstrumentsRequires access

A new emissive-probe method for electron temperature measurement in radio-frequency plasmas

Kouta Kusaba, Haruo Shindo

Open publisher page 12 citations

Abstract

A new method to measure electron temperature by an emissive probe has been proposed. The method is based on measurement of the functional relationship between the floating potential and the heating voltage of emissive probe. From the measured data of the floating potential change as a function of the heating voltage, the electron temperature could be determined by comparing with the theoretical curve obtained under the assumption of Maxwellian distribution. The overall characteristic of the floating potential change could be explained as a function of the heating voltage. The electron temperatures obtained by the present method were consistent with those measured by the rf-compensated Langmuir probe within the error. These experimental verifications were made in the electron density range of 2.6x10(11)-2.8x10(12) cm(-3). It was stressed that the present method is advantageous in that the probe is operated in a floating condition, hence applicable to plasmas produced in an insulated container.

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What this paper is about

A new method to measure electron temperature by an emissive probe has been proposed. The method is based on measurement of the functional relationship between the floating potential and the heating voltage of emissive probe. From the measured data of the floating potential change as a function of the heating voltage, the electron temperature could be determined by comparing with the theoretical curve obtained under the assumption of Maxwellian distribution. The overall characteristic of the floating potential change could be explained as a function of the heating voltage. The electron temperatures obtained by the present method were consistent with those measured by the rf-compensated Langmuir probe within the error. These experimental verifications were made in the electron density range of 2.6x10(11)-2.8x10(12) cm(-3). It was stressed that the present method is advantageous in that the probe is operated in a floating condition, hence applicable to plasmas produced in an insulated container.

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Available abstract

A new method to measure electron temperature by an emissive probe has been proposed. The method is based on measurement of the functional relationship between the floating potential and the heating voltage of emissive probe. From the measured data of the floating potential change as a function of the heating voltage, the electron temperature could be determined by comparing with the theoretical curve obtained under the assumption of Maxwellian distribution. The overall characteristic of the floating potential change could be explained as a function of the heating voltage. The electron temperatures obtained by the present method were consistent with those measured by the rf-compensated Langmuir probe within the error. These experimental verifications were made in the electron density range of 2.6x10(11)-2.8x10(12) cm(-3). It was stressed that the present method is advantageous in that the probe is operated in a floating condition, hence applicable to plasmas produced in an insulated container.

Key concepts: Langmuir probe, Electron temperature, Plasma, Materials science, Plasma diagnostics, Voltage, Temperature measurement, Electron

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