On the conditions of carbon nanotube growth in the arc discharge
Michael Keidar, Anthony M. Waas
Abstract
Open-access reader
Michael Keidar, Anthony M. Waas
Abstract
Open-access reader
The conditions for single wall carbon nanotube formation in the arc discharge method of nanotube production are described. Carbon nanotube seed formation and charging in the interelectrode gap are found to be very important effects that may alter carbon nanotube formation on the cathode surface. The model predicts that the long carbon nanotubes formed in the relatively dense plasma region can be deposited on the cathode surface. The nanotubes in the cathode deposit are primarily oriented in the cathode surface plane and not along the electric field. This prediction is qualitatively confirmed by an SEM analysis of the cathode deposit.
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The conditions for single wall carbon nanotube formation in the arc discharge method of nanotube production are described. Carbon nanotube seed formation and charging in the interelectrode gap are found to be very important effects that may alter carbon nanotube formation on the cathode surface. The model predicts that the long carbon nanotubes formed in the relatively dense plasma region can be deposited on the cathode surface. The nanotubes in the cathode deposit are primarily oriented in the cathode surface plane and not along the electric field. This prediction is qualitatively confirmed by an SEM analysis of the cathode deposit.
Key concepts: Carbon nanotube, Materials science, Cathode, Electric arc, Nanotube, Plasma, Carbon nanotube quantum dot, Nanotechnology