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Ammonia Dissociation on Oxygen Covered Palladium Studied with a Hydrogen Sensitive Pd-MOS Device

J. Fogelberg, I. Lundström, L.‐G. Petersson

Open publisher page 16 citations

Abstract

Dissociation of ammonia on clean and oxygen covered Pd surfaces has been studied with a hydrogen sensitive Pd-MOS structure and masspectrometry, at pressures between 10 -10 and 10 -8 Torr and temperatures between 323 and 523 K. The results are compared with the behaviour of hydrogen on the same type of surfaces. It is shown that oxygen is needed for the ammonia dissociation and that water is formed in a Langmuir-Hinshelwood reaction. The possibility to use the Pd-MOS device to determine when the surface is oxygen free is also pointed out.

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What this paper is about

Dissociation of ammonia on clean and oxygen covered Pd surfaces has been studied with a hydrogen sensitive Pd-MOS structure and masspectrometry, at pressures between 10 -10 and 10 -8 Torr and temperatures between 323 and 523 K. The results are compared with the behaviour of hydrogen on the same type of surfaces. It is shown that oxygen is needed for the ammonia dissociation and that water is formed in a Langmuir-Hinshelwood reaction. The possibility to use the Pd-MOS device to determine when the surface is oxygen free is also pointed out.

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Available abstract

Dissociation of ammonia on clean and oxygen covered Pd surfaces has been studied with a hydrogen sensitive Pd-MOS structure and masspectrometry, at pressures between 10 -10 and 10 -8 Torr and temperatures between 323 and 523 K. The results are compared with the behaviour of hydrogen on the same type of surfaces. It is shown that oxygen is needed for the ammonia dissociation and that water is formed in a Langmuir-Hinshelwood reaction. The possibility to use the Pd-MOS device to determine when the surface is oxygen free is also pointed out.

Key concepts: Dissociation (chemistry), Torr, Oxygen, Palladium, Hydrogen, Ammonia, Inorganic chemistry, Materials science

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