The Adone wiggler x-ray lithography beamline
E. Burattini, Antonio Grilli, A. Balerna, E. Bernieri, S. Simeoni, C. Mencuccini, Chen Qian-Hong
Abstract
E. Burattini, Antonio Grilli, A. Balerna, E. Bernieri, S. Simeoni, C. Mencuccini, Chen Qian-Hong
Abstract
A soft x-ray beamline, utilizing the radiation produced by the six-pole wiggler of the Adone storage ring, has been realized. The beamline allows the exposure of large area resists by means of a double-mirror scanning system or mechanically moving the wafer. The mechanical, geometrical, and spectral characteristics of the beamline will be described.
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A soft x-ray beamline, utilizing the radiation produced by the six-pole wiggler of the Adone storage ring, has been realized. The beamline allows the exposure of large area resists by means of a double-mirror scanning system or mechanically moving the wafer. The mechanical, geometrical, and spectral characteristics of the beamline will be described.
Key concepts: Beamline, Wiggler, Storage ring, Optics, Synchrotron radiation, Lithography, Wafer, Resist