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Nitrogen Plasma Source Ion Implantation (PSII) for Improvement of Blood-Compatibility of Silicon

Yang Ping, Guojiang Wan, Xinxin Xie, Y.X. Leng, Hong Zhou, Paul K. Chu, Nan Huang

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Key concepts: Materials science, Plasma, Compatibility (geochemistry), Nitrogen, Silicon, Ion, Ion implantation, Optoelectronics

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