Reflection High-Energy Electron Diffraction Studies of Vicinal Si(111) Surfaces
Hiroki Hibino, Yukinobu Shinoda, Yoshihiro Kobayashi, Kiyomasa Sugii
Abstract
Hiroki Hibino, Yukinobu Shinoda, Yoshihiro Kobayashi, Kiyomasa Sugii
Abstract
Analysis of the reflection high-energy electron diffraction (RHEED) patterns from the vicinal Si(111) surfaces misoriented to [112̄] shows that step bunching takes place on the surface, and the surface breaks up into (111) and (331) facets. A previously unreported superstructure is found on the (331) facet. From the temperature dependence of the diffraction spot positions, this superstructure and the 7×7 structure on the (111) facet are shown to cause the reconstruction-induced faceting.
OpenAlex reports 25 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
Analysis of the reflection high-energy electron diffraction (RHEED) patterns from the vicinal Si(111) surfaces misoriented to [112̄] shows that step bunching takes place on the surface, and the surface breaks up into (111) and (331) facets. A previously unreported superstructure is found on the (331) facet. From the temperature dependence of the diffraction spot positions, this superstructure and the 7×7 structure on the (111) facet are shown to cause the reconstruction-induced faceting.
Key concepts: Vicinal, Reflection high-energy electron diffraction, Superstructure, Electron diffraction, Faceting, Facet (psychology), Reflection (computer programming), Diffraction