Towards fast AFM-based nanometrology and nanomanufacturing
Georg Schitter, Juergen Steininger, Friedjof C. A. Heuck, U. Staufer
Abstract
Georg Schitter, Juergen Steininger, Friedjof C. A. Heuck, U. Staufer
Abstract
Application of atomic force microscopes (AFMs) in production processes for nanometrology and nanomanufacturing is still hampered by the slow operation speed, by the low level of automation, and by insufficient control over production parameters for material deposition. This contribution discusses some recent development to improve the speed of AFMs by means of mechatronic system integration to improve the scanning speed and the bandwidth for controlling the probe-sample interaction, as well as advances from MEMS to functionalise AFM-probes for selective measurements and dip-pen nanolithography. The improved performance and functionality of the resulting prototype AFMs will enable better use of AFM technology in nanomanufacturing.
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Application of atomic force microscopes (AFMs) in production processes for nanometrology and nanomanufacturing is still hampered by the slow operation speed, by the low level of automation, and by insufficient control over production parameters for material deposition. This contribution discusses some recent development to improve the speed of AFMs by means of mechatronic system integration to improve the scanning speed and the bandwidth for controlling the probe-sample interaction, as well as advances from MEMS to functionalise AFM-probes for selective measurements and dip-pen nanolithography. The improved performance and functionality of the resulting prototype AFMs will enable better use of AFM technology in nanomanufacturing.
Key concepts: Nanomanufacturing, Nanometrology, Materials science, Atomic force microscopy, Nanotechnology, Microelectromechanical systems, Nanolithography, Fabrication