1989•Japanese Journal of Applied PhysicsOpen access

A Beamline and Its Components for SR Lithography

Takashi Kaneko, Sei-ichi Itabashi, Y. Saitoh, Hideo Yoshihara, Toyoki Kitayama

Abstract

An efficient beamline for synchrotron radiation (SR) lithography has been built for the synchrotron radiation facility at NTT's Atsugi R & D Center. The relationship between the reflectivity and the surface roughness of the platinum-coated X-ray mirror, one of the key components of the beamline, is measured. The results confirm that it is necessary for the grazing angle of the mirror to be smaller than 2°. A beamline consisting of two X-ray mirror optics and two X-ray windows is proposed for exposure in an atmospheric environment. The optimum mirror optics for converging and collimating the X-ray beam are investigated using a ray-tracing technique, and their feasibility is experimentally confirmed.

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Key concepts: Beamline, Optics, Synchrotron radiation, X-ray optics, Collimated light, Lithography, Synchrotron, Physics