1986•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access
Impact Of 1X Reticle Defects For Submicron Production Lithography
Kevin Zollinger, C. P. O'Mahony, M. S. Chang
Open publisher page 2 citations
Abstract
A new test reticle with programmed defects has been designed to evaluate the impact of 1X reticle defects for micron and submicron design rules. This reticle has been used to examine the performance of the present generation of automatic reticle inspection systems, as well as to investigate the printability of defects using a 1 um 1X lens. Printability of contact holes, shaped contacts, and pinholes have been compared. Conclusions relevant to the manufacture of 1X reticles for micron and submicron device work are presented here.