2005•IEICE Transactions on ElectronicsRequires access

Low On-Voltage Operation AlGaN/GaN Schottky Barrier Diode with a Dual Schottky Structure

S. YOSHIDA

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Abstract

We propose a novel Schottky barrier diode with a dual Schodky structure combined with an AlGaN/GaN heterostructure. The purpose of this diode was to lower the on-state voltage and to maintain the high reverse breakdown voltage. An AlGaN/GaN heterostructure was grown using a metalorganic chemical vapor deposition (MOCVD). The Schottky barrier diode with a dual Schottky structure was fabricated on the AlGaN/GaN heterostructure. As a result, the on-voltage of the diode was below 0.1 V and the reverse breakdown voltage was over 350 V.

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What this paper is about

We propose a novel Schottky barrier diode with a dual Schodky structure combined with an AlGaN/GaN heterostructure. The purpose of this diode was to lower the on-state voltage and to maintain the high reverse breakdown voltage. An AlGaN/GaN heterostructure was grown using a metalorganic chemical vapor deposition (MOCVD). The Schottky barrier diode with a dual Schottky structure was fabricated on the AlGaN/GaN heterostructure. As a result, the on-voltage of the diode was below 0.1 V and the reverse breakdown voltage was over 350 V.

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Available abstract

We propose a novel Schottky barrier diode with a dual Schodky structure combined with an AlGaN/GaN heterostructure. The purpose of this diode was to lower the on-state voltage and to maintain the high reverse breakdown voltage. An AlGaN/GaN heterostructure was grown using a metalorganic chemical vapor deposition (MOCVD). The Schottky barrier diode with a dual Schottky structure was fabricated on the AlGaN/GaN heterostructure. As a result, the on-voltage of the diode was below 0.1 V and the reverse breakdown voltage was over 350 V.

Key concepts: Schottky diode, Optoelectronics, Materials science, Schottky barrier, Heterojunction, Breakdown voltage, Diode, Metalorganic vapour phase epitaxy

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