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Organometallic Chemical Vapor Deposition: the Roles of Precursor Design and Growth Ambient in Film Properties

William Smith Rees, Henry A. Luten, Virgil L. Goedken

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Key concepts: Microelectronics, Materials science, Oxidizing agent, Chemical vapor deposition, Ceramic, Yttria-stabilized zirconia, Vapor pressure, Decomposition

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Organometallic Chemical Vapor Deposition: the Roles of Precursor Design and Growth Ambient in Film Properties — Research Paper | ScholarLens