Neutral donor-acceptor-pair recombination under a uniform electric field
H. X. Jiang
Abstract
H. X. Jiang
Abstract
The kinetics of the recombination of electrons trapped by donors, with holes trapped by acceptors, in semiconductor materials within a uniform electric field has been investigated. A simple form has been derived which shows that the decay rate of neutral donor-acceptor-pair (DAP) recombination increases under the presence of the electric field. This analysis can also be applied to the processes of neutral DAP recombination in quantum wells and superlattices where electric fields are always present in the interface regions.
OpenAlex reports 2 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
The kinetics of the recombination of electrons trapped by donors, with holes trapped by acceptors, in semiconductor materials within a uniform electric field has been investigated. A simple form has been derived which shows that the decay rate of neutral donor-acceptor-pair (DAP) recombination increases under the presence of the electric field. This analysis can also be applied to the processes of neutral DAP recombination in quantum wells and superlattices where electric fields are always present in the interface regions.
Key concepts: Recombination, Electric field, Electron, Superlattice, Atomic physics, Acceptor, Recombination rate, Carrier generation and recombination