1983•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access

X-Ray Lithography Exposures Using Synchrotron Radiation

J. P. Silverman, Rolf P. Haelbich, W. D. Grobman, J. M. Warlaumont

Abstract

A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in operation at Brookhaven National Laboratory. The characteristics of synchrotron radiation and the reasons for using such a source are discussed. A description of the beamline and its control system is given, and results of early exposures are presented.

About this research paper

What this paper is about

Why it matters

OpenAlex reports 5 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Key concepts: Beamline, Synchrotron radiation, Lithography, National laboratory, Synchrotron, Physics, Optics, X-ray